M.Sc. Daniel Kool

Nanopatterning - Nanoanalysis - Photonic Materials

Member - Research Student

Nanopatterning surfaces by block copolymer lithograhpy

E-Mail:
dkool@mail.uni-paderborn.de
Phone:
+49 5251 60-2685
Office Address:
Warburger Str. 100
33098 Paderborn
Room:
A4.336

Publications

Latest Publications

High‐Resolution Study of Changes in Morphology and Chemistry of Cylindrical PS‐ <i>b</i> ‐PMMA Block Copolymer Nanomasks during Mask Development
J. Bürger, H. Venugopal, D. Kool, T. de los Arcos, A. Gonzalez Orive, G. Grundmeier, K. Brassat, J.K.N. Lindner, Advanced Materials Interfaces 9 (2022).
DOI
Selective Area Growth of Cubic Gallium Nitride in Nanoscopic Silicon Dioxide Masks
F. Meier, M. Littmann, J. Bürger, T. Riedl, D. Kool, J. Lindner, D. Reuter, D.J. As, Physica Status Solidi (b) (2022).
DOI
High‐Resolution Study of Changes in Morphology and Chemistry of Cylindrical PS‐ <i>b</i> ‐PMMA Block Copolymer Nanomasks during Mask Development
J. Bürger, H. Venugopal, D. Kool, M.T. de los Arcos de Pedro, A. Gonzalez Orive, G. Grundmeier, K. Brassat, J. Lindner, Advanced Materials Interfaces 9 (2022).
DOI
Characterisation of the PS-PMMA Interfaces in Microphase Separated Block Copolymer Thin Films by Analytical (S)TEM
J. Bürger, V. Kunnathully, D. Kool, J. Lindner, K. Brassat, Nanomaterials 10 (2020).
DOI
Modification of block copolymer lithography masks by O2 plasma treatment: Insights from lift off experiments, nanopore etching and free membranes
K. Brassat, D. Kool, J. Lindner, To Be Submitted (n.d.).
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Further Information

Work

Patterning and structuring of surfaces by the block copolymer lithography and subsequently characterization of the structures with different analysis methods (AFM, SEM, TEM, ...)